We present a robust method for computing locally bijective global parametrizations aligned with a given cross-field. The singularities of the parametrization in general agree with singularities of the field, except in a small number of cases when several additional cones need to be added in a controlled way. Parametric lines can be constrained to follow an arbitrary set of feature lines on the surface. Our method is based on constructing an initial quad patch partition using robust cross-field integral line tracing. This process is followed by an algorithm modifying the quad layout structure to ensure that consistent parametric lengths can be assigned to the edges. For most meshes, the layout modification algorithm does not add new singularities; a small number of singularities may be added to resolve an explicitly described set of layouts. We demonstrate that our algorithm succeeds on a test data set of over a hundred meshes.
|Журнал||ACM Transactions on Graphics|
|Состояние||Опубликовано - 2014|
|Опубликовано для внешнего пользования||Да|
|Событие||41st International Conference and Exhibition on Computer Graphics and Interactive Techniques, ACM SIGGRAPH 2014 - Vancouver, BC, Канада|
Продолжительность: 10 авг. 2014 → 14 авг. 2014