Large-area metallic photonic crystal fabrication with interference lithography and dry etching

H. C. Guo, D. Nau, A. Radke, X. P. Zhang, J. Stodolka, X. L. Yang, S. G. Tikhodeev, N. A. Gippius, H. Giessen

Результат исследований: Вклад в журналСтатьярецензирование

54 Цитирования (Scopus)

Аннотация

Large-area one-dimensional periodic metallic structures were fabricated on a waveguide layer with interference lithography and dry etching. As narrow as 115-nm gold nanowires were obtained with a period of 395 nm, covering a homogeneous area as large as 5 × 5 mm2. Extinction measurements demonstrate the strong coupling between waveguide mode and gold-particle plasmon resonance. We demonstrate good agreement with a scattering-matrix theory. The dispersion of the metallic photonic crystals was obtained by angle-resolved measurements. This method represents a simple and low-cost way to fabricate large-area metallic photonic crystals.

Язык оригиналаАнглийский
Страницы (с-по)271-275
Число страниц5
ЖурналApplied Physics B: Lasers and Optics
Том81
Номер выпуска2-3
DOI
СостояниеОпубликовано - июл. 2005
Опубликовано для внешнего пользованияДа

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