UV (325 nm) holographic recording of gratings in indium oxide films fabricated by reactive pulsed laser deposition has been investigated as a function of growth temperature, oxygen pressure and angle of incidence of the plasma plume on the substrate. The influence of the ambient environment (air or vacuum) and the film temperature during recording has also been studied. Large steady state refractive index changes up to 6 × 10-3 were observed in layers grown at an oblique angle of 75°. About 77% of the magnitude of these changes residues after thermal annealing and is attributed to UV-induced permanent structural rearrangements. In contrast, refractive index changes in films grown at normal incidence were smaller in magnitude and completely reversible.
|Журнал||Applied Physics A: Materials Science and Processing|
|Состояние||Опубликовано - апр. 2002|
|Опубликовано для внешнего пользования||Да|