Flexible coherent diffraction lithography by tunable phase arrays in lithium niobate crystals

M. Paturzo, S. Grilli, S. Mailis, G. Coppola, M. Iodice, M. Gioffré, P. Ferraro

Результат исследований: Вклад в журналСтатьярецензирование

9 Цитирования (Scopus)

Аннотация

Flexible coherent diffraction lithography is proposed and preliminarily tested by means of an optical phase mask. The phase mask consisted of a two-dimensional hexagonal lattice of reversed ferroelectric domains engineered in a z-cut lithium niobate substrate and was electro-optically tunable. Appropriate phase shift values across adjacent reversed domains were induced by the application of an external electric field along the z-axis of the crystal via transparent electrodes. Photolithographic exposures of the self-imaging near-field diffraction intensity patterns, at various planes corresponding to the Talbot distances, were performed by using different values of the driving electric field signal.

Язык оригиналаАнглийский
Страницы (с-по)1950-1953
Число страниц4
ЖурналOptics Communications
Том281
Номер выпуска8
DOI
СостояниеОпубликовано - 15 апр. 2008
Опубликовано для внешнего пользованияДа

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