Photonic micro-structures produced by selective etching of laser-crystallized amorphous silicon

G. Martinez-Jimenez, Y. Franz, A. F.J. Runge, M. Ceschia, N. Healy, S. Z. Oo, A. Tarazona, H. M.H. Chong, A. C. Peacock, S. Mailis

    Research output: Contribution to journalArticlepeer-review

    3 Citations (Scopus)

    Abstract

    We present a method for the production of polycrystalline Si (poly-Si) photonic micro-structures based on laser writing. The method consists of local laser-induced crystallization of amorphous silicon (a-Si) followed by selective etching in chemical agents that act preferentially on the a-Si material, consequently revealing the poly-Si content of the film. We have studied the characteristics of these structures as a function of the laser processing parameters and we demonstrate their potential photonic functionality by fabricating polycrystalline silicon ridge optical waveguides. Preliminary waveguide transmission performance results indicated an optical transmission loss of 9 dB/cm in these unrefined devices.

    Original languageEnglish
    Pages (from-to)2573-2581
    Number of pages9
    JournalOptical Materials Express
    Volume9
    Issue number6
    DOIs
    Publication statusPublished - 1 Jun 2019

    Fingerprint

    Dive into the research topics of 'Photonic micro-structures produced by selective etching of laser-crystallized amorphous silicon'. Together they form a unique fingerprint.

    Cite this