Near-fild optical lithography in application to plasmonic antennas characterization

A. V. Shelaev, P. S. Dorozhkin, V. A. Bykov

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Proposed a method of measurements for both electrical field enhancement and size of near-field localization area for plasmonic antenna-probe. The method is based on optical modification of photosensitive sample. Shown the results of the proposed method and subdiffraction resolution of test image is demonstrated.

Original languageEnglish
Pages (from-to)837-841
Number of pages5
JournalInstruments and Experimental Techniques
Volume59
Issue number6
DOIs
Publication statusPublished - 1 Nov 2016

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