Multiplexed static and dynamic photorefraction at 780 nm IN Bi12 SiO20

S. Mailis, N. A. Vainos

Research output: Contribution to journalConference articlepeer-review

Abstract

In this paper we report preliminary results on the observation of multiplexed dynamic and static photorefractive behavior in the diffusion regime, at 780 nm in BSO. In the present case the dynamic gratings follow the expected response but the static gratings are exhibiting a lifetime which is nearly four orders of magnitude larger than the dynamic gratings at quite high erasing beam intensities.

Original languageEnglish
Pages (from-to)174-179
Number of pages6
JournalIEE Conference Publication
Issue number379
Publication statusPublished - 1993
Externally publishedYes
EventProceedings of the 4th International Conference on Holographic Systems, Components and Applications - Neuchatel, Switz
Duration: 13 Sep 199315 Sep 1993

Cite this