Microdeposition of metal and oxide structures using ultrashort laser pulses

I. Zergioti, S. Mailis, N. A. Vainos, P. Papakonstantinou, C. Kalpouzos, C. P. Grigoropoulos, C. Fotakis

Research output: Contribution to journalArticlepeer-review

152 Citations (Scopus)

Abstract

Microdeposition of chromium metal and indium oxide microstructures via femtosecond KrF excimer laser (248 nm) ablation in a forward-transfer mode has been studied. The short pulse length, the short absorption length, and the consequently limited thermal diffusion, lower the ablation threshold and enable the deposition of high-definition features. Experiments carried out in a low-vacuum (0.1 Torr) environment result in highly reproducible, well-adhered structures of submicron size. Microdeposition of Cr and polycrystalline In2O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures.

Original languageEnglish
Pages (from-to)579-582
Number of pages4
JournalApplied Physics A: Materials Science and Processing
Volume66
Issue number5
DOIs
Publication statusPublished - 1998
Externally publishedYes

Fingerprint

Dive into the research topics of 'Microdeposition of metal and oxide structures using ultrashort laser pulses'. Together they form a unique fingerprint.

Cite this