Locally erasable couplers for optical device testing in silicon on insulator

R. Topley, G. Martinez-Jimenez, L. Ofaolain, N. Healy, S. Mailis, D. J. Thomson, F. Y. Gardes, A. C. Peacock, D. N.R. Payne, G. Z. Mashanovich, G. T. Reed

Research output: Contribution to journalArticlepeer-review

28 Citations (Scopus)


Wafer scale testing is critical to reducing production costs and increasing production yield. Here we report a method that allows testing of individual optical components within a complex optical integrated circuit. The method is based on diffractive grating couplers, fabricated using lattice damage induced by ion implantation of germanium. These gratings can be erased via localised laser annealing, which is shown to reduce the outcoupling efficiency by over 20 dB after the device testing is completed. Laser annealing was achieved by employing a CW laser, operating at visible wavelengths thus reducing equipment costs and allowing annealing through thick oxide claddings. The process used also retains CMOS compatibility.

Original languageEnglish
Article number6819411
Pages (from-to)2248-2253
Number of pages6
JournalJournal of Lightwave Technology
Issue number12
Publication statusPublished - 15 Jun 2014
Externally publishedYes


  • Gratings
  • optical components
  • optical couplers
  • optical coupling
  • optical diffraction
  • optical planar waveguide couplers
  • periodic structures


Dive into the research topics of 'Locally erasable couplers for optical device testing in silicon on insulator'. Together they form a unique fingerprint.

Cite this