Large-area metallic photonic crystal fabrication with interference lithography and dry etching

H. C. Guo, D. Nau, A. Radke, X. P. Zhang, J. Stodolka, X. L. Yang, S. G. Tikhodeev, N. A. Gippius, H. Giessen

Research output: Contribution to journalArticlepeer-review

54 Citations (Scopus)

Abstract

Large-area one-dimensional periodic metallic structures were fabricated on a waveguide layer with interference lithography and dry etching. As narrow as 115-nm gold nanowires were obtained with a period of 395 nm, covering a homogeneous area as large as 5 × 5 mm2. Extinction measurements demonstrate the strong coupling between waveguide mode and gold-particle plasmon resonance. We demonstrate good agreement with a scattering-matrix theory. The dispersion of the metallic photonic crystals was obtained by angle-resolved measurements. This method represents a simple and low-cost way to fabricate large-area metallic photonic crystals.

Original languageEnglish
Pages (from-to)271-275
Number of pages5
JournalApplied Physics B: Lasers and Optics
Volume81
Issue number2-3
DOIs
Publication statusPublished - Jul 2005
Externally publishedYes

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