Influence of Hydrogen on the Structure of Cerium Films Obtained by Magnetron Sputter Deposition on Semiconductor Wafers

V. N. Verbetskii, S. V. Mitrokhin, G. A. Badun, S. A. Evlashin, A. A. Tepanov, V. A. Bunyaev

Research output: Contribution to journalArticlepeer-review

Abstract

Abstract: The influence of hydrogen on the structure of thin cerium films formed by the method of magnetron sputter deposition was investigated in this work. Hydrogen-charging of the films was carried out by the method of Langmuir hydrogen dissociation on a tungsten substrate. The cerium hydride films were coated with a protective layer of nickel or chromium. It is demonstrated in this work that the used method of hydrogen charging can be used for introduction of hydrogen also into other hydride-forming metals and alloys.

Original languageEnglish
Pages (from-to)977-981
Number of pages5
JournalInorganic Materials: Applied Research
Volume11
Issue number4
DOIs
Publication statusPublished - 1 Jul 2020

Keywords

  • cerium hydride
  • magnetron sputter deposition
  • rare earth metals
  • thin films

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