Growth of indium oxide (In2O3) thin films on glass substrates is performed by pulsed laser ablation of a metallic indium target in an oxygen atmosphere. X-ray diffraction analysis verifies that a transition, from amorphous to polycrystalline film growth, occurs at a temperature of 150°C. Films grown under optimized conditions exhibit optical transmission higher than 80% in the visible light. Ultraviolet radiation (λ = 325 nm) induced dynamic holographic recording in films deposited at specific temperature and oxygen pressure settings is also demonstrated.
|Number of pages||4|
|Journal||Applied Physics A: Materials Science and Processing|
|Publication status||Published - 1998|