Flexible coherent diffraction lithography by tunable phase arrays in lithium niobate crystals

M. Paturzo, S. Grilli, S. Mailis, G. Coppola, M. Iodice, M. Gioffré, P. Ferraro

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

Flexible coherent diffraction lithography is proposed and preliminarily tested by means of an optical phase mask. The phase mask consisted of a two-dimensional hexagonal lattice of reversed ferroelectric domains engineered in a z-cut lithium niobate substrate and was electro-optically tunable. Appropriate phase shift values across adjacent reversed domains were induced by the application of an external electric field along the z-axis of the crystal via transparent electrodes. Photolithographic exposures of the self-imaging near-field diffraction intensity patterns, at various planes corresponding to the Talbot distances, were performed by using different values of the driving electric field signal.

Original languageEnglish
Pages (from-to)1950-1953
Number of pages4
JournalOptics Communications
Volume281
Issue number8
DOIs
Publication statusPublished - 15 Apr 2008
Externally publishedYes

Keywords

  • Electro-optic materials
  • Optical lithography
  • Self-imaging

Fingerprint

Dive into the research topics of 'Flexible coherent diffraction lithography by tunable phase arrays in lithium niobate crystals'. Together they form a unique fingerprint.

Cite this