First-principles investigation of high-κ dielectrics: Comparison between the silicates and oxides of hafnium and zirconium

G. M. Rignanese, X. Gonze, Gyuchang Jun, Kyeongjae Cho, Alfredo Pasquarello

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130 Citations (Scopus)

Abstract

Using density-functional theory, we investigate the structural, vibrational, and dielectric properties of Hf and Zr oxides and silicates which have drawn considerable attention as alternative high-κ materials. For the silicates, we consider hafnon HfSiO4 and zircon ZrSiO4; while for the oxides, we study the cubic and tetragonal phases of HfO 2 and ZrO2. Special emphasis is put on the analysis of the differences and similarities between Hf and Zr in these materials. In particular, we discuss the Born effective charge tensors, the phonon frequencies at the Γ point of the Brillouin zone, and the dielectric permittivity tensors. Our study reveals very similar properties of Hf and Zr compounds, which are essentially related to the chemical homology of Hf and Zr.

Original languageEnglish
Article number184301
Pages (from-to)184301-1-184301-10
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume69
Issue number18
DOIs
Publication statusPublished - May 2004
Externally publishedYes

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