Effect of annealing on wear resistance and electroconductivity of copper processed by high-pressure torsion

Alexander P. Zhilyaev, I. Shakhova, A. Belyakov, R. Kaibyshev, Terence G. Langdon

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

The influences of annealing temperature on the wear properties and electrical conductivity of Cu were studied after processing by high-pressure torsion (HPT). The annealing of Cu specimens processed by HPT leads to an increase in electroconductivity and a decrease in the wear rate. It is apparent that a nanotribolayer at the surface induced during wear sliding plays a more significant role than the ultrafine-grained structure. A slight increase was observed in the microhardness of HPT copper specimens upon annealing at a relatively low temperature (100 °C), and this is most likely due to a change in texture. The annealing leads to an increase in the Taylor factor by ∼5 %, which is in good agreement with the increase in the microhardness level which is also by ∼5 %. It is apparent that low-temperature annealing of HPT copper may produce optimal properties of the specimens including high strength and electroconductivity with a lower wear rate.

Original languageEnglish
Pages (from-to)2270-2278
Number of pages9
JournalJournal of Materials Science
Volume49
Issue number5
DOIs
Publication statusPublished - Mar 2014
Externally publishedYes

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