Direct microdeposition of diffractive structures using femtosecond excimer laser

I. Zergioti, S. Mailis, N. A. Vainos, C. P. Grigoropoulos, C. Fotakis

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

A study of the microdeposition of thin Cr diffractive structures using femtosecond ultraviolet laser radiation in a forward transfer mode is presented. A KrF excimer laser (λ = 248 nm) having 500 fs pulse duration coupled to a high-power image projection micromachining workstation is used. The ablated material is transferred onto a receiving target glass substrate placed parallel to the source film. Experiments are carried out in a miniature vacuum cell under a low vacuum pressure 10-1 Torr. The distance between the source and target surfaces is variable from near-contact to several hundreds of microns. High definition metal diffractive patterns are produced via a direct mask projection scheme, and first results on optical interconnect hologram reconstruction are presented.

Original languageEnglish
Pages (from-to)313-315
Number of pages3
JournalLaser Physics
Volume8
Issue number1
Publication statusPublished - Jan 1998
Externally publishedYes

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