Continuous wave ultraviolet radiation induced frustration of etching in lithium niobate single crystals

S. Mailis, C. Riziotis, P. G.R. Smith, J. G. Scott, R. W. Eason

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

Illumination of the -z face of congruent lithium niobate single crystals with continuous wave (c.w.) ultraviolet (UV) laser radiation modifies the response of the surface to subsequent acid etching. A frequency doubled Ar + laser (λ=244 nm) was used to illuminate the -z crystal face making it resistive to HF etching and thus transforming the illuminated tracks into ridge structures. This process enables the fabrication of relief patterns in a photolithographic manner. Spatially resolved Raman spectroscopy indicates preservation of the good crystal quality after irradiation.

Original languageEnglish
Pages (from-to)46-52
Number of pages7
JournalApplied Surface Science
Volume206
Issue number1-4
DOIs
Publication statusPublished - 15 Feb 2003
Externally publishedYes

Keywords

  • Chemical etching
  • Lithium niobate
  • Surface patterning
  • Ultraviolet radiation

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