Light-induced frustration of etching in congurent lithium niobate using continuous wave ultra violet laser was studied. The periodic ridges that were exhibited after chemical etching corresponded exactly to the illuminating beam track. Micro-Raman analysis of the etch frustrated area showed small broadening and shifting of some spectral lines, compared with unaffected material, indicating structural modifications of the surface.
|Number of pages||2|
|Publication status||Published - 2002|
|Event||Conference on Lasers and Electro-Optics (CLEO 2002) - Long Beach, CA, United States|
Duration: 19 May 2002 → 24 May 2002
|Conference||Conference on Lasers and Electro-Optics (CLEO 2002)|
|City||Long Beach, CA|
|Period||19/05/02 → 24/05/02|