Continuous wave ultra violet laser induced frustration of etching in congruent lithium niobate

S. Mailis, C. Riziotis, R. W. Eason

Research output: Contribution to conferencePaperpeer-review

Abstract

Light-induced frustration of etching in congurent lithium niobate using continuous wave ultra violet laser was studied. The periodic ridges that were exhibited after chemical etching corresponded exactly to the illuminating beam track. Micro-Raman analysis of the etch frustrated area showed small broadening and shifting of some spectral lines, compared with unaffected material, indicating structural modifications of the surface.

Original languageEnglish
Pages645-646
Number of pages2
Publication statusPublished - 2002
Externally publishedYes
EventConference on Lasers and Electro-Optics (CLEO 2002) - Long Beach, CA, United States
Duration: 19 May 200224 May 2002

Conference

ConferenceConference on Lasers and Electro-Optics (CLEO 2002)
Country/TerritoryUnited States
CityLong Beach, CA
Period19/05/0224/05/02

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