Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies

A. S. Kamenetskih, A. I. Kukharenko, E. Z. Kurmaev, N. A. Skorikov, N. V. Gavrilov, S. O. Cholakh, A. V. Chukin, V. M. Zainullina, M. A. Korotin

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

The results of characterization of TiAlSiON hard coatings deposited on ferric-chromium AISI 430 stainless steel by plasma enhanced magnetron sputtering are presented. The coating with maximum hardness (of 43GPa) was obtained at the following optimal values of elemental concentrations: Si ~5at.%, Al ~15at.%, and Ti ~27at.%. The value of gaseous mixture (Ar-N2) pressure was of 0.13Pa and the value of partial pressure of oxygen (O2) was 1.3·10-3Pa. The X-ray diffraction (XRD) measurements showed the presence of Ti(Al)N. High-energy resolved XPS spectra of core levels revealed the formation of Ti-N, Ti-O-N, Si-N and Al-O-N bonds. Comparison of XPS valence band spectra with specially performed density functional theory calculations for disordered Ti0.5Al0.5N1-xOx (0≤x≤0.3) phases demonstrated that a Ti(Al)OxNy phase is formed on the surface of AISI430 steel upon the plasma enhanced magnetron sputtering, which can provide a good combination of high hardness and additional oxidation resistance of this material.

Original languageEnglish
Pages (from-to)87-91
Number of pages5
JournalSurface and Coatings Technology
Volume278
DOIs
Publication statusPublished - 25 Sep 2015
Externally publishedYes

Keywords

  • Density functional theory
  • Electronic structure
  • Magnetron sputtering
  • TiAlON coatings
  • X-ray photoelectron spectra

Fingerprint

Dive into the research topics of 'Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies'. Together they form a unique fingerprint.

Cite this