Calculation of pore size distributions in low-k films

Peter I. Ravikovitch, Aleksey Vishnyakov, Alexander V. Neimark, Manuela R. Carrott, Patrícia A. Russo, Peter J. Carrott

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)


Porosimetry is a key technology for the characterization of porous low-k dielectric films. A critical appraisal of the models used for quantitative interpretation of vapor adsorption isotherms obtained by ellipsometric and x-ray reflectivity measurements shows that conventional macroscopic methods based on the Kelvin equation are inadequate on the nanoscale. We have developed an advanced molecular model of toluene adsorption in nanopores and the method for pore size distribution calculations based on this mode. The method has been verified against reference ordered porous silicas and applied to selected low-k films. Significant deviations of the Kelvin equation were found for pores < 4 nm. The new method provides a unified framework for reliable calculations of micro- and mesopore size distributions. The results are generally consistent with available data of small angle neutron scattering porosimetry.

Original languageEnglish
Title of host publicationCHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2005 - International Conference
Number of pages5
Publication statusPublished - 9 Sep 2005
Externally publishedYes
Event2005 International Conference on Characterization and Metrology for ULSI Technology - Richardson, TX, United States
Duration: 15 Mar 200518 Mar 2005

Publication series

NameAIP Conference Proceedings
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616


Conference2005 International Conference on Characterization and Metrology for ULSI Technology
Country/TerritoryUnited States
CityRichardson, TX


  • Adsorption
  • Pore size distribution
  • Porosimetry
  • SANS
  • Toluene


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