Atomic steps on the Si(111) surface during submonolayer gold adsorption

S. S. Kosolobov, A. V. Latyshev

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The effect of adsorption of submonolayer gold coatings on the Si(111) surface morphology in the temperature range 850-1260°C has been investigated by means in situ ultrahigh-vacuum reflection electron microscopy and ex situ atomic force microscopy. Reversible transformations of the silicon surface: from regular monoatomic steps to step bunches, depending on the gold coverage and direction of the electric current resistively heating the crystal, have been revealed. Stability of the regular distribution of monoatomic steps upon heating of the crystal by an alternating current is shown. The effect of an electric field applied to the sample on the diffusion of silicon and gold adatoms has been analyzed taking into account the effective adatom charge.

Original languageEnglish
Pages (from-to)176-180
Number of pages5
JournalBulletin of the Russian Academy of Sciences: Physics
Volume72
Issue number2
DOIs
Publication statusPublished - Feb 2008
Externally publishedYes

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